6059.1:
Nano-Patterning - Generation of random nano-patterns in polymer surfaces due to replication of nano-crystal grain-boundaries
Abstract
Several thin film materials, (e.g. nonocrystalline Silicon, nc-Si:H) have columnar texture with column-diameters in nanometer range, but micrometers in column-length. It is the objective of the project to replicate the lateral pattern of the columns to a substrate. The diffusion of Aluminum into the grain-boundaries generates selectivity towards RIE etching. Hereby the grains and the underlying substrate are etched away rather than the heavily Aluminum-loaded grain-boundaries that will remain. This approach generates a random pattern at nanometric scale that allows to go new ways towards ”Super Lamert” surfaces that presents an ideal scenario of light trapping in Thin Film solar cells.