6028.2:
Tool for nanolithography
Abstract
Tool for nanolithography – A. Kulik, S. Grange, C. Baur, L. Forrò - EPFL
Classical lithography processes are approaching their physical limits in dimensions of features. Several trials were performed, using SPM techniques to attain nanometer scale characteristic size. Three obvious problems were encountered:
i) releveance of the tip - surface interaction used
ii) speed
iii) no available tools, or limited functionality
The third and partially second problem will be addressed in this project.
Our groups have documented experience in nanomanipulation (working prototype demonstrated in Oct 2001) as well in quantitative applications of Scanning Probe techniques. Acquired experience in full, rapid and complete control of the commercial microscopes founded the base of the project. Used SPM family is equipped with closed loop linearization which insures repeatable and distortion-free geometry.
Idea of the project is to read and interpret standard graphic formats (like Postscript, HPGL, etc) and draw them on the substrate using SPM tip. This simple, but adequate concept will allow users to create their patterns using any available software, and printing result to file, being further read, interpreted and drawn by our system. Other, industry standard, formats will be equally evaluated and possibly implemented. Relations between graphical commands (such as color, line width etc) and several used nanolithography schemes (such as current, time, force etc) should be established and implemented.
Since our group is controlling SPM through the LAN (network), there is an easy idea of parallel nanolithography performed using several microscopes in the same time. One can even try to use distant machines through informal contact between SPM groups all over the world.