6599.1:
Determination of aspect-ratio limits of nano-structures in sapphire
Abstract
This feasibility study aims at developing a new technique for the high-aspect-ratio nano-structuring of a non-Si-based optical material. Sapphire is a very robust material with superior optical, mechanical, and thermal properties compared to silica and glass. We will investigate deep etching of nano-structures in sapphire through etch-resistant SiO2 masks pre-structured by electron beam lithography or focused electron beam induced deposition and determine the limits of the aspect ratio that can be fabricated in sapphire by chlorine-based reactive ion etching.