5828.1:
Membrane for local deposition: Apparatus and method for defining surface structures at the micron and nanoscale beyond lithography
Abstract
We aim to develop ultra-thin mechanical membranes with apertures to be used as miniature shadow-mask for area-selective deposition of material patterns at high dynamic range (<100 nm - 10 µm) on arbitrary surfaces. We will use silicon based MEMS and nanoengineering methods, including E-beam lithography and FIB milling. For large membranes we will implement mechanical reinforcement structures. The stencils will be used for evaporation experminents to allow fast prototyping patterning, beyond lithography, compatible with metallic and semiconducting, but also biological materials. A market analysis will evaluate the potential for a commercial product. Laboratories without lithography equipment can use the membrane-tool to define custom micro/nanopatterns, and hence advance the R&D in their respective field (bio-chemical devices, pharmaceutical, …)