5638.1:
Hot Electron Emission Array
Abstract
The goal of the present project is the realization of an array of hot electron emitters based on a suitably nanostructured semiconductor-insulator-metal (SIM) tunneling device. The hot electron emission array is an array of individually addressable cold cathodes based on electron tunneling through a structured nm thin gate oxide. The array will serve as source of hot electrons (of several eV kinetic energy) which can (i) be injected into an organic light emitting layer, (ii) be accelerated onto a phosphorous screen, and (iii) be employed in 1:1 electron projection lithography. (i) and (ii) are flat panel screen applications whereas (iii) is an application in e-beam lithography where the array acts as source wafer which is projected onto wafers. Since the array is flexibly addressable arbitrary circuits can be realized. The device will be realized with main-stream C-MOS technology.
A patent "Hot Electron Emission Array for e-beam Photolithography and Display Screens" of the envisioned prototype and of the three applications (i) - (iii) is pending under PCT/CH00/00378. Please find a copy of the patent and of the letter declaring that it is pending is in the annexes of the proposal.