5779.2:
Improvement of Semiconductor Process Simulator by Atomistic Simulation Techniques (MOLDYN)
Abstract
The goal is to develop physically based accurate process simulation tools through the use of atomistic simulations. The starting conditions are simplified by way of a combined molecular dynamics (MD) and/or binary collision approximation (BCA) study for the ballistic stage, and kinetic Monte Carlo (KMC) for the beginning of the annealing. In addition, diffusion and clustering models for arsenic and phosphorus are developed with density functional theory (DFT) and implemented into the process simulator DIOS-ISE (a strategic product of the partner ISE-AG).